Tetraethylammonium Hydroxideyog ib qho organic compound uas zoo nkaus li cov kua tsis muaj xim uas muaj qhov ruaj khov ntawm qhov kub thiab txias, tab sis tuaj yeem decompose ntawm qhov kub thiab txias thiab muaj cov acids muaj zog lossis muaj zog oxidants. Nws tus lej CAS yog 77-98-5, EINECS tus lej yog 201-073-3, tshuaj formula yog C₈H₂₁NO, thiab qhov hnyav molecular yog 147.26. Nws qhov ceev ntawm 25℃yog 1.023 g / mL, melting point yog - 98 degree, boiling point yog 110 degree, thiab flash point yog 11 degree. Nws yog soluble nyob rau hauv dej, thiab ntawm 20 degree, lub refractive index ntawm sodium D kab yog 1.422. Hauv dej ntawm 20 degree, nws tus nqi pH yog ntau dua 13. Kev cia khoom yog 2-8 degree.
Tetraethylammonium Hydroxide
Tetraethylammonium Hydroxide yog ib qho organic puag nrog ntau yam kev siv:
- Chemical synthesis: Hauv cov organic synthesis cov tshuaj tiv thaiv, nws tuaj yeem txhawb kev hloov pauv ntawm cov reactants ntawm ib theem mus rau lwm qhov, yog li ua kom nrawm cov tshuaj tiv thaiv thiab txhim kho cov tshuaj tiv thaiv. Raws li lub hauv paus muaj zog, nws tuaj yeem siv rau cov kua qaub- cov tshuaj tiv thaiv hauv qab nruab nrab, dehydrohalogenation cov tshuaj tiv thaiv, thiab lwm yam kev cuam tshuam uas yuav tsum tau muaj cov kab mob alkaline. Hauv qee qhov kev cuam tshuam xws li ester hydrolysis thiab nitrile hydrolysis, nws tuaj yeem muab qhov chaw alkaline los txhawb cov tshuaj tiv thaiv.
- Kev kho deg: Hauv kev lag luam semiconductor, nws yog siv rau kev tu thiab etching txheej txheem ntawm silicon wafers. Nws tuaj yeem tshem tawm cov impurities thiab cov organic teeb meem ntawm qhov chaw ntawm silicon wafers yam tsis muaj kev puas tsuaj rau saum npoo ntawm silicon wafers, uas yuav pab txhim kho cov precision thiab zoo ntawm cov chip manufacturing. Nws tuaj yeem siv rau cov txheej txheem pretreatment xws li degreasing thiab xeb tshem tawm ntawm cov hlau nto, uas tuaj yeem txhim kho cov wettability ntawm cov hlau nto thiab txhim kho cov adhesion ntawm cov txheej tom ntej los yog electroplating.
- Kev lag luam Electronics: Nyob rau hauv cov txheej txheem photolithography, nws yog siv los ua tus tsim tawm los xaiv cov txheej txheem uas tsis muaj qhov cuam tshuam ntawm photoresist, yog li tsim cov qauv meej ntawm semiconductor wafers. Nws yog ib qho ntawm cov khoom siv tsis tseem ceeb rau kev tsim cov khoom siv hluav taws xob ultra-loj- nplai integrated circuits.
- Catalyst carrier: Nws tuaj yeem thauj khoom ntawm qee cov ntaub ntawv ntxeem tau los ua cov khoom siv catalyst thauj cov hlau catalysts lossis lwm yam khoom siv los txhim kho kev ruaj ntseg thiab kev ua haujlwm ntawm cov catalyst.
Gneebioyog ib lub tuam txhab tshwj xeeb hauv kev tshawb fawb, kev tsim kho, kev tsim khoom thiab kev muag khoom ntawm phytochemicals thiab tshuaj zoo.Our Hoobkas tau tsim nyob rau hauv 2016 thiab nyob rau hauv lub xeev Henan, npog thaj tsam ntawm 3,600 square meters. Peb muaj cov kws tshaj lij, zoo - nruab thiab siab - pab pawg R & D zoo nrog ntau tshaj 10 xyoo ntawm R&D kev paub.
Thovtiv tauj pebyog koj xav tau.